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Introduction Optical Proximity Correction OPC is a resolution enhancement technique based on optical lithography. It is used in sub-wavelength lithography to deal with the severe image distortions. These image distortions typically include the: increased corner rounding, line-end shortening and changes in the width when located in isolated or dense environments. This technique helps in improving the imaging resolution. It is
Client is a fortune 500 company and is leader in HPC and visual computing. Client had very ambitious goal on PPA (~15% higher utilization, ~30% increase in frequency), compared to their previous graphics core versions. To achieve these PPA goals, there was need of enhancing flow/methodology, tool, technology & design.
Signoff Semi had a plan to work on the internal Research and Development for developing a proof of concept of a low power, low-cost computing platform. Signoff as a company did not had exposure to develop such products. This required expertise on Architecture, Front end Design, Firmware and toolkit development, FPGA prototyping/validation etc.