OCV, AOCV, and POCV Fig1: Derate Factor on Setup Analysis          Fig2: Derate Factor on Hold Analysis Issues in OCV:   Advance On-Chip Variation (AOCV):                  Fig3: Bounding box for cell and net distance Distance: If the distance increases, systematic variation will increase, and to mitigate the variation, we need to use a higher derate value. So along with the

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Introduction Optical Proximity Correction OPC is a resolution enhancement technique based on optical lithography. It is used in sub-wavelength lithography to deal with the severe image distortions. These image distortions typically include the: increased corner rounding, line-end shortening and changes in the width when located in isolated or dense environments. This technique helps in improving the imaging resolution. It is

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Layout Blog: Standard Cells Multiple Architectures Standard-cell library offers multiple architecture for best optimisation in performance, power, and area requirements of Digital designs. High Performance Architecture, a High-Density Architecture for varied customer application requirements. In each requirement (power/performance/area), layout approaches will be different to meet the design specifications. Here, we will covering in more common guidelines. Standard Cell Templates: Based

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Standard cells are designed based on power, area and performance. First step is cell architecture. Cell architecture is all about deciding cell height based on pitch & library requirements. We have to first decide the track, pitch, β ratio, possible PMOS width and NMOS width.